CzechNanoLab provides open access to a comprehensive set of interconnected areas of tools & expertise in nanoscience

The Nanofabrication lab features an 800 m2 class 100 cleanroom equipped with over 35 pieces of the process and analytical instrumentation for complex research projects that require micro and nanoscale fabrication using different substrates ranging in size from small pieces to 150mm wafers. The primary scope is on electronics, optics, and MEMS. Equipment is available for metal deposition, dry and wet etching, electron beam, and laser photolithography.

Nanocharacterization laboratory offers a broad range of analytical equipment, allowing to perform a variety of electrical and magnetic measurements with magnetic fields up to 9T and temperatures down to 1.6K. Also, multiple optical, X-ray, ion and electron spectroscopies can be performed. Everything is complemented by multiple scanning probe, electron, ion and optical microscopy techniques.

Allows imaging, as well as chemical and crystalographic characterization of various types of materials. Avilable techniques include electron microscopy - both transmission and scanning - including EDS, WDS, EBSD, EELS microanalytical techniques, focused ion beam and X-ray diffraction/scattering.

The new chemical laboratory is intended to serve users interested in chemical synthesis, analysis, and sample preparation. It is possible to measure basic chemical parameters (pH, temperature, mass, etc.) and prepare chemical mixtures and solutions. The laboratory is equipped with a microwave and thermal reactor for synthesis. We offer the measurement of the pore distribution of the material or to verify the specific surface area of powdered substances using BET analysis. The NMR instrument can be used to study the structure of molecules, their interactions, the dynamics of molecules, and the kinetics of mixture composition.

The laboratory offers research services in the field of computed tomography (micro and nano CT). Research includes the development and application of tomographic methods in various fields. It works closely with industry to help address R&D issues in various manufacturing and non-manufacturing sectors through non-destructive testing.

The molecular beam epitaxy system is designed for growing thin-film semiconductors of III-V type. Besides classical GaAs and AlGaAs based structures, it is capable of growing films of ferromagnetic semiconductor (Ga, Mn)As and other materials for spintronics. The lab comprises also a system for thin-film growth by metal-organic vapor phase epitaxy.

Metal-organic vapor phase epitaxy (MOVPE) apparatuses are suitable for the preparation of nitride semiconductor heterostructures containing layers with their thickness in the range of monoatomic layers to several micrometers. The group also offer possibilty to characterize the luminescence and transport properties of semiconductors.

In the laboratory of Diamond Layers and Carbon Nanostructures, there are two unique deposition systems designed for microwave plasma equipment supporting chemical vapor deposition. It allows to prepare thin layers of nanocrystalline diamond and / or silicon from chemical vapors in plasma for use in optoelectronics, nanoelectronics and bioelectronic applications.

The laboratory of material structuring is a set of instruments placed in clean rooms that are designed for preparation and characterisation of nanostructures. The system is used to define lateral micro- and nanostructures by optical and electron beam lithography.

The theory group performs a whole range of calculations from analytical to sophisticated numerical first-principles calculations. The employed numerical tools are specifically chosen to match the requirements of a given physical problem.

The laboratory includes a set of four scanning probe microscopes (SPM) and one scanning electron microscope (SEM). The scanning probe microscopes can be combined with other techniques and offer a correlation of morphology and different local physical properties.

The Structural Analysis focuses on the development and application of modern crystallographic methods for the analysis of crystal structures from X-ray, neutron or electron diffraction data. Classical crystallography provides the positions of atoms within crystalline chemical compounds, as long as they are available as reasonably sized crystals thus yielding a sufficiently strong signal on X-ray sources.

The laboratory of electron microscopy (LEM) focuses on the complex characterization of inorganic materials at micro/nanoscale. LEM operates transmission and scanning electron microscopes with a wide range of analytical techniques as well as instruments for advanced sample preparation.

The Laboratory combines experimental and theoretical tools to explore novel material properties of nanostructures artificially built on surfaces. We use ultra-high vacuum low-temperature scanning probe microscopy to investigate their physical and chemical properties at the atomic scale.

The laboratory performs basic optical characterization (absorption, reflection and photoluminescence spectroscopy), magneto-optical characterization (MCD, MCB, MLD and MLB spectra), time-resolved ultrafast laser spectroscopy (pump and probe method) and characterization by time-resolved magneto-optical Kerr effect (TR-MOKE).