Diffraction optics
Details
Type of access
Demonstration of RI capabilities,
Regular service
Research area
Devices
Topic
Integrated planar optics
Guarantor
Šikola, Tomáš
Equipment
Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
Ion beam etching Scia Systems Coat 200
RIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100
E-beam writer RAITH150 Two
Electron beam evaporator BESTEC
Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
RIE by F Chemistry and PECVD of hard C-based films Oxford Instruments Plasma Technology PlasmaPro 80
Ion beam etching Scia Systems Coat 200
RIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100
E-beam writer RAITH150 Two
Electron beam evaporator BESTEC
Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200