Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200
Atomic Layer Deposition is a deposition technique for very thin layers with the thickness control down to a single atomic layer. It belongs to the CVD techniques family. The thickness precision is achieved by pulsed deposition, where first a metal-containing precursor is introduced into the chamber and after a short time (allowing for monolayer adsorption) the chamber is pumped down. The following step is exposure to the oxidizing precursor (for oxides) or nitrogen-containing precursor (for nitrides). Thus, a monolayer of the target material is grown. The metal-containing precursors are usually organometallic ones, for oxidation a water or oxygen plasma can be used, nitridation is done using nitrogen plasma. To achieve the deposition in the ALD mode, the sample is heated up to a certain temperature, for most processes being in the range from 150 to 300 °C.
Publications
Thalluri, S. M.; Rodriguez‐Pereira, J.; Michalicka, J.; Kolíbalová, E.; Hromadko, L.; Slang, S.; Pouzar, M.; Sopha, H.; Zazpe, R.; Macak, J. M., 2025: Enhancing Alkaline Hydrogen Evolution Reaction on Ru- Decorated TiO2 Nanotube Layers: Synergistic Role of Ti3+, Ru Single Atoms, and Ru Nanoparticles. ENERGY & ENVIRONMENTAL MATERIALS, doi: 10.1002/eem2.12864 (TITAN, LYRA, KRATOS-XPS, RIGAKU3, ALD)
KEPIČ, P.; LIŠKA, P.; IDESOVÁ, B.; CAHA, O.; LIGMAJER, F.; ŠIKOLA, T., 2024: Pulsed laser deposition of Sb<sub>2</sub>S<sub>3</sub> films for phase-change tunable nanophotonics. NEW JOURNAL OF PHYSICS 26 (1), p. 1 - 8, doi: 10.1088/1367-2630/ad1696 (ICON-SPM, KRATOS-XPS, LYRA, ALD, RIGAKU9, WOOLLAM-VIS)
BAWAB, B.; THALLURI, S.; KOLÍBALOVÁ, E.; ZAZPE MENDIOROZ, R.; JELÍNEK, L.; RODRIGUEZ PEREIRA, J.; MACÁK, J., 2024: Synergistic effect of Pd single atoms and nanoparticles deposited on carbon supports by ALD boosts alkaline hydrogen evolution reaction. CHEMICAL ENGINEERING JOURNAL 482, p. 1 - 9, doi: 10.1016/j.cej.2024.148959 (ALD, VERIOS, TITAN, KRATOS-XPS, RIGAKU3)
DESHMUKH, S.; GAO, W.; MICHALIČKA, J.; PUMERA, M., 2024: Nanoscopic decoration of multivalent vanadium oxide on Laser-Induced graphene fibers via atomic layer deposition for flexible gel supercapacitors. CHEMICAL ENGINEERING JOURNAL 480, doi: 10.1016/j.cej.2023.147895 (ALD, KRATOS-XPS, RIGAKU3, TITAN)
Kunc, J.; Fridrišek, T.; Shestopalov, M.; Jo, J.; Park, K., 2024: Graphene–insulator–metal diodes: Enhanced dielectric strength of the Al2O3 barrier. AIP ADVANCES 14 (9), p. 1 - 9, doi: 10.1063/5.0223763 (RAITH, RIE-FLUORINE, ALD, EVAPORATOR, WIRE-BONDER, KRATOS-XPS)
AIGNER, A.; LIGMAJER, F.; ROVENSKÁ, K.; HOLOBRÁDEK, J.; IDESOVÁ, B.; MAIER, S.; TITTL, A.; MENEZES, L., 2024: Engineering of Active and Passive Loss in High-Quality-Factor Vanadium Dioxide-Based BIC Metasurfaces. NANO LETTERS 24 (35), p. 10742 - 8, doi: 10.1021/acs.nanolett.4c01703 (KAUFMAN, ALD, EVAPORATOR)
Henrotte, O.; Kment, Š.; Naldoni, A., 2024: Mass Transport Limitations in Plasmonic Photocatalysis. NANO LETTERS 24 (29), p. 8851 - 8858, doi: 10.1021/acs.nanolett.4c01386 (ALD)
KOVAŘÍK, M.; CITTERBERG, D.; PAIVA DE ARAÚJO, E.; ŠIKOLA, T.; KOLÍBAL, M., 2024: Understanding the Effect of Electron Irradiation on WS2 Nanotube Devices to Improve Prototyping Routines. ACS APPLIED ELECTRONIC MATERIALS 6 (12), p. 8776 - 7, doi: 10.1021/acsaelm.4c01450 (ALD, MIRA-EBL, EVAPORATOR, MPS150, KEITHLEY-4200, LYRA, WIRE-BONDER)
GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: Strong coupling in an Au plasmonic antenna-SiO2 layer system: A hybrid-mode analysis. PHYSICAL REVIEW B 107 (12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144 (ALD, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, ICON-SPM, WOOLLAM-MIR)
WOJEWODA, O.; LIGMAJER, F.; HRTOŇ, M.; KLÍMA, J.; DHANKHAR, M.; DAVÍDKOVÁ, K.; STAŇO, M.; HOLOBRÁDEK, J.; KRČMA, J.; ZLÁMAL, J.; ŠIKOLA, T.; URBÁNEK, M., 2023: Observing high-k magnons with Mie-resonance-enhanced Brillouin light scattering. COMMUNICATIONS PHYSICS 6 (1), p. 1 - 10, doi: 10.1038/s42005-023-01214-z (RAITH, MIRA-EBL, EVAPORATOR, MAGNETRON, ALD, LYRA, ICON-SPM, BRILLOUIN)
GAO, W.; PERALES RONDON, J.; MICHALIČKA, J.; PUMERA, M., 2023: Ultrathin manganese oxides enhance the electrocatalytic properties of 3D printed carbon catalysts for electrochemical nitrate reduction to ammonia. APPLIED CATALYSIS B: ENVIRONMENTAL 330, doi: 10.1016/j.apcatb.2023.122632 (ALD, VERIOS, LYRA, TITAN, KRATOS-XPS, JASCO)
HEMZAL, D.; PRÁŠEK, J.; HRDÝ, R.; DRBOHLAVOVÁ, J.; KOPP, R., 2023: Surface-enhanced Raman spectroscopy investigation of PO3- (4) to Ag/Al2O3 nanopatterned substrates binding and its dynamics for sensitive detection of phosphate in water. JOURNAL OF RAMAN SPECTROSCOPY, p. 1074 - 10, doi: 10.1002/jrs.6587 (EVAPORATOR, ALD)
Henrotte, O.; Kment, Š.; Naldoni, A., 2023: Interfacial States in Au/Reduced TiO2 Plasmonic Photocatalysts Quench Hot-Carrier Photoactivity. JOURNAL OF PHYSICAL CHEMISTRY C 127 (32), p. 15861 - 15870, doi: 10.1021/acs.jpcc.3c04176 (ALD)
NG, S.; SANNA, M.; REDONDO NEGRETE, E.; PUMERA, M., 2023: Engineering 3D-printed carbon structures with atomic layer deposition coatings as photoelectrocatalysts for water splitting. JOURNAL OF MATERIALS CHEMISTRY A 12 (1), p. 396 - 9, doi: 10.1039/d3ta04460b (ALD, KRATOS-XPS, VERIOS)
ROVENSKÁ, K.; LIGMAJER, F.; IDESOVÁ, B.; KEPIČ, P.; LIŠKA, J.; CHOCHOL, J.; ŠIKOLA, T., 2023: Structural color filters with compensated angle-dependent shifts. OPTICS EXPRESS 31 (26), p. 43048 - 9, doi: 10.1364/OE.506069 (EVAPORATOR, MIRA-EBL, RIE-CHLORINE, ALD)
Idesová, B., 2023: Design and fabrication of dielectric metasurfaces for ultraviolet wavelengths. MASTER'S THESIS, p. 1 - 71 (EVAPORATOR, ALD, RAITH, NANOCALC, SCIA)
GAO, W.; MICHALIČKA, J.; PUMERA, M., 2022: Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries. SMALL 18 (1), p. 2105572-1 - 13, doi: 10.1002/smll.202105572 (ALD, VERIOS, MIRA-STAN, TITAN, RIGAKU3, KRATOS-XPS)
Sreedhara, MB.; Bukvisova, K.; Khadiev, A.; Citterberg, D.; Cohen, H.; Balema, V.; Pathak, AK.; Novikov, D.; Leitus, G.; Kaplan-Ashiri, I.; Kolibal, M.; Enyashin, AN.; Houben, L.; Tenne, R., 2022: Nanotubes from the Misfit Layered Compound (SmS)(1.)19TaS2: Atomic Structure, Charge Transfer, and Electrical Properties. CHEMISTRY OF MATERIALS 34 (4), p. 1838 - 16, doi: 10.1021/acs.chemmater.1c04106 (TITAN, HELIOS, RAITH, EVAPORATOR, MPS150, KEITHLEY-4200, ALD)
WANG, L.; NG, S.; JYOTI, J.; PUMERA, M., 2022: Al2O3/Covalent Organic Framework on 3D-Printed Nanocarbon Electrodes for Enhanced Biomarker Detection. ACS APPLIED NANO MATERIALS 5 (7), p. 9719 - 9, doi: 10.1021/acsanm.2c01937 (ALD, KRATOS-XPS, VERIOS)
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664 (ALD, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
NG, S.; IFFELSBERGER, C.; MICHALIČKA, J.; PUMERA, M., 2021: Atomic Layer Deposition of Electrocatalytic Insulator Al2O3 on Three-Dimensional Printed Nanocarbons. ACS NANO 15 (1), p. 686 - 12, doi: 10.1021/acsnano.0c06961 (TITAN, ALD, KRATOS-XPS, VERIOS)
KAUSHIK, P.; ELIÁŠ, M.; PRÁŠEK, J.; MICHALIČKA, J.; ZAJÍČKOVÁ, L., 2021: Manipulating MWCNT/TiO2 heterostructure morphology at nanoscale and its implications to NO2 sensing properties. MATERIALS CHEMISTRY AND PHYSICS 271, p. 124901-1 - 11, doi: 10.1016/j.matchemphys.2021.124901 (EVAPORATOR, PECVD-NANOFAB, DIENER, ALD, RIGAKU9, VERIOS, TITAN)
Dhankhar, M.;, 2021: Magnetic vortex based memory device. PH.D. THESIS, p. 1 - 100 (KERR-MICROSCOPE, ICON-SPM, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD, WIRE-BONDER, SUSS-RCD8)
Dallaev, R., 2021: Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods. VACUUM 193, doi: 10.1016/j.vacuum.2021.110533 (ALD, ICON-SPM, SIMS)
Burda, D.; Allaham, M.M.; Knapek, A.; Sobola, D.; Mousa, M.S., 2021: Field emission properties of sharp tungsten cathodes coated with a thin resilient oxide barrier. INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, p. 178 - 179, doi: 10.1109/IVNC52431.2021.9600704 (ALD)
Pejchal, T., 2021: Towards highly-doped Ge and ZnO nanowires: Growth, characterization and doping level analysis. PH.D. THESIS (NANOSAM, VERIOS, KRATOS-XPS, HELIOS, TITAN, ALD, EVAPORATOR, MIRA-EBL, MPS150)
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
Rovenská, K., 2020: Dielectric metasurfaces as modern optical components. MASTER'S THESIS, p. 1 - 57 (MAGNETRON, DEKTAK, KRATOS-XPS, MIRA-EBL, EVAPORATOR, VERIOS, RIE-FLUORINE, ALD)
KAUSHIK, P.; ELIÁŠ, M.; MICHALIČKA, J.; HEGEMANN, D.; PYTLÍČEK, Z.; NEČAS, D.; ZAJÍČKOVÁ, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 9, doi: 10.1016/j.surfcoat.2019.04.031 (ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, RIGAKU3, KRATOS-XPS, VERIOS, TITAN)
Fecko, P., 2019: Gecko mimicking surfaces. MASTER'S THESIS, p. 1 - 52 (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM, PARYLENE-SCS, XEF2)
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 4, doi: 10.1109/ISSE.2019.8810156 (ALD, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
Pokorný, D., 2019: Morphology study of ultra thin layers by XPS analysis of multiple peaks of a single element. MASTER'S THESIS, p. 1 - 71 (KRATOS-XPS, WOOLLAM-VIS, ALD)
Vida, J., 2019: Deposition of ternary oxides with titanium and characterization of their optical and electrical properties. MASTER'S THESIS, p. 1 - 50 (KRATOS-XPS, ALD, WOOLLAM-VIS, VUVAS, RIGAKU3, EVAPORATOR, SUSS-MA8, SUMMIT)
Konečný, A., 2019: Evaluation of Different Dielectrics For Mid-Infrared Waveguides. BACHELOR'S THESIS, p. 1 - 32 (MAGNETRON, PECVD, ALD, WOOLLAM-MIR)
Procházka, P., 2018: Fabrication of graphene and study of its physical properties. PH.D. THESIS, p. 1 - 139 (ALD, DIENER, EVAPORATOR, MIRA-EBL, PECVD, WIRE-BONDER)
STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10 (37), p. 17520 - 5, doi: 10.1039/c8nr06483k (ALD, DIENER, DWL, EVAPORATOR)
Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER'S THESIS, p. 1 - 68 (DWL, ALD, MAGNETRON, EVAPORATOR, RIE-FLUORINE, RIE-CHLORINE, SUSS-MA8, DEKTAK, MPS150)
Kaushik, P.; Elias, M.; Prasek, J.; Pytlicek, Z.; Zajickova, L., 2018: Titanium dioxide modified multi-walled carbon nanotubes as room temperature NH3 gas sensors. ELECTRONICS TECHNOLOGY (ISSE), p. 959 - 961 (ALD, LYRA)
Xiao, N.;Villena, M.A.; Yuan, B.; Chen, S.; Wang, B.; Eliáš, M.; Shi, Y.; Hui, F.; Jing, X.; Scheuermann, A.; Tang, K.; McIntyre, P.C., 2017: Resistive Random Access Memory Cells with a Bilayer TiO2/SiOX Insulating Stack for Simultaneous Filamentary and Distributed Resistive Switching. ADVANCED FUNCTIONAL MATERIALS 27 (33), p. 859 - 7, doi: 10.1002/adfm.201700384 (ALD)
PROCHÁZKA, P.; MAREČEK, D.; LIŠKOVÁ, Z.; ČECHAL, J.; ŠIKOLA, T., 2017: X-ray induced electrostatic graphene doping via defect charging in gate dielectric. SCIENTIFIC REPORTS 7, p. 1 - 7, doi: 10.1038/s41598-017-00673-z (MIRA-EBL, DIENER, ALD, WIRE-BONDER)
Musálek, T., 2016: Semiconductor nanowire growth utilizing alloyed catalyst. MASTER’S THESIS, p. 1 - 52 (VERIOS, LYRA, MIRA-EBL, ALD)
Andrýsek, M., 2016: Preparation of surfaces with diffusion barrier for studying initial phase of semiconductor nanowire growth. BACHELOR’S THESIS, p. 1 - 22 (LYRA, VERIOS, ALD)