UHV Complex system - PLD

Pulsed laser deposition (PLD) is a vacuum deposition using ablation of a target material with a pulsed ultraviolet laser. This technique is most often used for deposition of oxides, for example transition metal oxides; however, metals can be deposited as well. The highlight of this technique is the in-situ monitoring of sample growth with reflection high energy electron diffraction (RHEED) that in principle enables to monitor and control the grown on monolayer scale. The PLD chamber is attached to the UHV cluster and thus the PLD grown samples can be analyzed within the cluster or additional materials can be deposited on the same substrate.

Publications

Hong, N. H.; Friák, M.; Pazourek, P.; Pham, N. S.; Nhu, T. Q.; Kiaba, M.; Gazdová, K.; Pavlů, J., 2024: 2D nature of magnetic states at SnO2 surfaces: a combined experimental and theoretical study. RSC ADVANCES 14 (19), p. 13583 - 13590, doi: 10.1039/D4RA00734D (RIGAKU3, UHV-PLD, VERSALAB, WOOLLAM-VIS, KRATOS-XPS)

Krpenský, J., 2022: Fabrication, optimization and in-situ characterization of thermally tunable vanadium dioxide nanostructures. MASTER'S THESIS (EVAPORATOR, UHV-PLD, LYRA, VERIOS, TITAN)

Zahradník, M.; Kiaba, M.; Espinoza, S.; Rebarz, M.; Andreasson, J.; Caha, O.; Abadizaman, F.; Munzar, D.; Dubroka, A., 2022: Photoinduced insulator-to-metal transition and coherent acoustic phonon propagation in LaCoO3 thin films explored by femtosecond pump-probe ellipsometry. PHYSICAL REVIEW B 105 (23), doi: 10.1103/PhysRevB.105.235113 (WOOLLAM-MIR, WOOLLAM-VIS, UHV-PLD, RIGAKU9)

Kiaba, M.; Caha, O.; Abadizaman, F.; Dubroka, A., 2022: Stabilization of the oxygen concentration in La0.3Sr0.7CoO3−δ thin films by 3 nm thin LaAlO3 capping layer. THIN SOLID FILMS 759, doi: 10.1016/j.tsf.2022.139438 (RIGAKU9, VERSALAB, UHV-PLD)

Číž, T., 2020: X-ray diffraction analysis of oxide layers. MASTER'S THESIS (KRATOS-XPS, WOOLLAM-VIS, RIGAKU9, UHV-PLD, SIMS)

Specification

Methods

Pulsed laser deposition (PLD) is a vacuum deposition using ablation of a target material with a pulsed ultraviolet laser. This technique is most often used for deposition of oxides, for example transition metal oxides; however, metals can be deposited as well. The highlight of this technique is the in-situ monitoring of sample growth with reflection high energy electron diffraction (RHEED) that in principle enables to monitor and control the grown on monolayer scale. The PLD chamber is attached to the UHV cluster and thus the PLD grown samples can be analyzed within the cluster or additional materials can be deposited on the same substrate.

Details

Type of access
Full-service (proposal-based)
Research area
Synthesis
Category
PVD
Subcategory
PLD
Guarantor
Dubroka, Adam
Site
CEITECNANO

Documents

List of Experienced Users in UHV Lab C1.38