UV Direct Write Laser system Heidelberg Instruments DWL 66-fs

The DWL 66FS laser lithography system is a high resolution pattern generator for low volume mask making and direct writing. The capabilities and flexibility of this system allows to use this research tool in MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors, CGHs, and all other applications that require microstructures. It can be used for mask making or direct exposure on basically any flat material coated with photoresist. Numerous optional features increase the flexibility and make the system suitable for more applications. If one of your applications requires a special technology, it can most likely be implemented in the DWL 66FS. The system can utilize a variety of different lasers, which makes it possible to expose nearly all photoresists, including UV resists like SU8. In addition to high resolution 2D patterns, it is also possible to create complex 3D structures in thick photoresist with a single pass. By supporting five different write modes the resolution and throughput of the system can be optimized for each application. The optional vector exposure mode will offer even further flexibility such as improved structure quality and a higher throughput for certain designs like waveguides or microfluidic channels. To ensure the stability of the system, it is placed in a climate chamber providing a constant temperature. The optical setup, the autofocus system and the high precision stage system guarantee the quality of the exposed structures. During operation a high resolution interferometer controls the position of the stage with high accuracy. All this allows the system to write structures down to 0.6 μm with an address grid of 50 nm. The DWL 66FS includes two CCD cameras used for metrology and alignment purposes. This enables the system to perform overlay exposures with high accuracy. Arbitrary structures on the substrate can be used for the alignment. The optional backside alignment system uses two additional cameras to align front side exposures to structures on the back side of the substrate.

Publications

Otýpka, M., 2024: Electric-current Control of Magnetic Textures in Synthetic Antiferromagnets. BACHELOR'S THESIS, p. 1 - 56 (MAGNETRON, VERSALAB, DWL, WIRE-BONDER, KERR-MICROSCOPE)

NOWAKOWSKA, M.; JAKEŠOVÁ, M.; SCHMIDT, T.; OPANČAR, A.; POLZ, M.; REIMER, R.; FUCHS, J.; PATZ, S.; ZIESEL, D.; SCHERUEBEL, S.; KORNMUELLER, K.; RIENMÜLLER, T.; DEREK, V.; GLOWACKI, E.; SCHINDL, R.; ÜÇAL, M., 2024: Light-Controlled Electric Stimulation with Organic Electrolytic Photocapacitors Achieves Complex Neuronal Network Activation: Semi-Chronic Study in Cortical Cell Culture and Rat Model. ADVANCED HEALTHCARE MATERIALS 13 (29), p. 1 - 19, doi: 10.1002/adhm.202401303 (DWL, SUSS-MA8)

GRYSZEL, M.; JAKEŠOVÁ, M.; VU, X.; INGEBRANDT, S.; GLOWACKI, E., 2024: Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering. ADVANCED HEALTHCARE MATERIALS, doi: 10.1002/adhm.202302400 (EVAPORATOR, DEKTAK, RIE-FLUORINE, DWL, SUSS-MA8)

Bevz, VM.; Mikhailov, MY.; Budinska, B.; Lamb-Camarena, S.; Shpilinska, SO.; Chumak, AV.; Urbanek, M.; Arndt, M.; Lang, W.; Dobrovolskiy, OV., 2023: Vortex Counting and Velocimetry for Slitted Superconducting Thin Strips. PHYSICAL REVIEW APPLIED 19 (3), doi: 10.1103/PhysRevApplied.19.034098 (DWL, LYRA, EVAPORATOR)

Hnilica, J., 2023: Current-induced domain wall propagation in ferrimagnetic wires. MASTER'S THESIS (MAGNETRON, VERSALAB, RIGAKU9, SUSS-RCD8, DWL, WIRE-BONDER, KERR-MICROSCOPE)

GABLECH, I.; BRODSKÝ, J.; VYROUBAL, P.; PIASTEK, J.; BARTOŠÍK, M.; PEKÁREK, J., 2022: Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers. JOURNAL OF MATERIALS SCIENCE 57 (3), p. 1923 - 13, doi: 10.1007/s10853-021-06846-6 (RIE-FLUORINE, DRIE, EVAPORATOR, WIRE-BONDER, MPS150, KEITHLEY-4200, SUSS-MA8, DWL)

Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: Silicon Vibrating Micro-Wire Resonators for Study of Quantum Turbulence in Superfluid He-4. JOURNAL OF LOW TEMPERATURE PHYSICS, doi: 10.1007/s10909-022-02675-2 (PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA)

Děcký, M., 2022: Fabrication and testing of microbolometer or other infrared detector based on plasmonic antennas. BACHELOR'S THESIS, p. 1 - 44 (LYRA, MIRA-EBL, EVAPORATOR, DWL, MPS150)

Brodský J., 2021: Gas sensors based on 1D and 2D materials. MASTER'S THESIS, p. 1 - 84 (DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, ICON-SPM, RIE-FLUORINE, DRIE, LYRA)

Dhankhar, M.;, 2021: Magnetic vortex based memory device. PH.D. THESIS, p. 1 - 100 (KERR-MICROSCOPE, ICON-SPM, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD, WIRE-BONDER, SUSS-RCD8)

Slavík, J., 2021: Patterning of excitable cells on multi-electrode arrays. PH.D. THESIS, p. 1 - 102 (DWL, EVAPORATOR, PARYLENE-SCS, RIE-FLUORINE, LYRA, MAGNETRON, ICON-SPM, LEICACOAT-NANO)

GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11 (4), p. 365 - 7, doi: 10.3390/mi11040365 (EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)

Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)

BARTOŠÍK, M.; MACH, J.; PIASTEK, J.; NEZVAL, D.; KONEČNÝ, M.; ŠVARC, V.; ENSSLIN, K.; ŠIKOLA, T., 2020: Mechanism and Suppression of Physisorbed-Water-Caused Hysteresis in Graphene FET Sensors. ACS SENSORS 5 (9), p. 2940 - 10, doi: 10.1021/acssensors.0c01441 (EVAPORATOR, DWL, DIENER)

LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38 (6), p. 38 - 6, doi: 10.1116/6.0000558 (SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA)

Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR'S THESIS, p. 1 - 50 (MPS150, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)

Fecko, P., 2019: Gecko mimicking surfaces. MASTER'S THESIS, p. 1 - 52 (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM, PARYLENE-SCS, XEF2)

HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 4, doi: 10.1109/ISSE.2019.8810156 (ALD, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)

PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 6, doi: 10.1109/ISSE.2019.8810293 (DRIE, ICON-SPM, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL)

GABLECH, I.; KLEMPA, J.; PEKÁREK, J.; VYROUBAL, P.; KUNZ, J.; NEUŽIL, P., 2019: Aluminum nitride based piezoelectric harvesters. 2019 19TH INTERNATIONAL CONFERENCE ON MICRO AND NANOTECHNOLOGY FOR POWER GENERATION AND ENERGY CONVERSION APPLICATIONS (POWERMEMS) (001), p. 1 - 4, doi: 10.1109/PowerMEMS49317.2019.82063211368 (DIENER, DRIE, DWL, KAUFMAN, RIE-CHLORINE, SUSS-MA8)

CHMELA, O.; SADÍLEK, J.; SAMA, DOMENECH-GIL, G.; J.; SOMER, J.; MOHAN, R.; ROMANO-RODRIGUEZ, A.; HUBÁLEK, J.; VALLEJOS VARGAS, S., 2018: Selectively arranged single-wire based nanosensor array systems for gas monitoring. NANOSCALE 10 (19), p. 9087 - 10, doi: 10.1039/c8nr01588k (RAITH, DWL, KAUFMAN, MAGNETRON, SCIA, RIE-FLUORINE, WIRE-BONDER, RIGAKU3)

STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10 (37), p. 17520 - 5, doi: 10.1039/c8nr06483k (ALD, DIENER, DWL, EVAPORATOR)

GABLECH, I.; SOMER, J.; FOHLEROVÁ, Z.; SVATOŠ, V.; PEKÁREK, J.; KURDÍK, S.; FENG, J.; FECKO, P.; PODEŠVA, P.; HUBÁLEK, J.; NEUŽIL, P., 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22 (9), p. NA - 7, doi: 10.1007/s10404-018-2125-6 (DRIE, DWL, SUSS-MA8, PARYLENE-SCS, XEF2)

Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER'S THESIS, p. 1 - 68 (DWL, ALD, MAGNETRON, EVAPORATOR, RIE-FLUORINE, RIE-CHLORINE, SUSS-MA8, DEKTAK, MPS150)

PODEŠVA, P.; GABLECH, I.; NEUŽIL, P., 2018: Nanostructured Gold Microelectrode Array for Ultrasensitive Detection of Heavy Metal Contamination. ANALYTICAL CHEMISTRY 90 (2), p. 1161 - 7, doi: 10.1021/acs.analchem.7b0372 (SUSS-MA8, DWL, SCIA, DIENER)

MACH, J.; PROCHÁZKA, P.; BARTOŠÍK, M.; NEZVAL, D.; PIASTEK, J.; HULVA, J.; ŠVARC, V.; KONEČNÝ, M.; KORMOŠ, L.; ŠIKOLA, T., 2017: Electronic transport properties of graphene doped by gallium. NANOTECHNOLOGY 28 (41), p. 1 - 10, doi: 10.1088/1361-6528/aa86a4 (DIENER, DWL, EVAPORATOR, WIRE-BONDER, LYRA)

CHMELA, O.; SADÍLEK, J.; VALLEJOS VARGAS, S.; HUBÁLEK, J., 2017: Microelectrode array system as platforms for single nanowire based sensors. JOURNAL OF ELECTRICAL ENGINEERING 68 (2), p. 158 - 5, doi: 10.1515/jee-2017-0023 (DWL, KAUFMAN, MPS150, RIGAKU3)

VAŇATKA, M.; URBÁNEK, M.; JÍRA, R.; FLAJŠMAN, L.; DHANKHAR, M.; IM, M.; MICHALIČKA, J.; UHLÍŘ, V.; ŠIKOLA, T., 2017: Magnetic vortex nucleation modes in static magnetic fields. AIP ADVANCES 7 (10), p. 1 - 8, doi: 10.1063/1.5006235 (DWL, EVAPORATOR, RAITH, TITAN, WIRE-BONDER)

Citterberg, D., 2017: Preparation of contacts to one-dimensional nanostructurs. BACHELOR'S THESIS, p. 1 - 26 (DWL, MIRA-EBL, WIRE-BONDER, EVAPORATOR)

Chmela, O; Sadilek, J; Sama, J; Romano-Rodriguez, A; Hubalek, J; Vallejos, S, 2017: Nanosensor array systems based on single functional wires selectively integrated and their sensing properties to C2H6O and NO2. NANOTECHNOLOGY VIII 10248, doi: 10.1117/12.2265000 (RAITH, DWL, KAUFMAN, SCIA, RIE-FLUORINE, MAGNETRON, RIGAKU3)

Gallery

Specification

Methods

sub 2-micrometer laser scanning lithography, maskmaking

Details

Type of access
Full-service (paid), Self-service
Research area
Devices
Category
Lithography
Subcategory
Direct write, UV
Guarantor
Fecko, Peter
Site
CEITECNANO
Location
CEITEC Nano - C1.29

Documents

DWL Troubleshooting
List of Experienced Users in Maskless Lithography Lab C1.29
DWL Guide
External Manuals & Docs