Resist coating and development system SÜSS MicroTec RCD8
The RCD8 coat and develop platform can be custom tailored anywhere from e.g. a basic manual spin coater to a GYRSET® enhanced coater and puddle & spray developer tool. It can handle small pieces as well as standard wafers up to 200 mm and serves therefore ideally for daily R&D work up to small scale production.
Publications
KAMNEV, K.; PYTLÍČEK, Z.; BENDOVÁ, M.; PRÁŠEK, J.; GISPERT-GUIRADO, F.; LLOBET, E.; MOZALEV, A., 2023: The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 24 (1), p. 1 - 17, doi: 10.1080/14686996.2022.2162324 (MAGNETRON, SUSS-MA8, SUSS-RCD8, VERIOS, KRATOS-XPS, MPS150)
Hnilica, J., 2023: Current-induced domain wall propagation in ferrimagnetic wires. MASTER'S THESIS (MAGNETRON, VERSALAB, RIGAKU9, SUSS-RCD8, DWL, WIRE-BONDER, KERR-MICROSCOPE)
Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: Silicon Vibrating Micro-Wire Resonators for Study of Quantum Turbulence in Superfluid He-4. JOURNAL OF LOW TEMPERATURE PHYSICS, doi: 10.1007/s10909-022-02675-2 (PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA)
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664 (ALD, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
Gaňová, M., 2022: Digital PCR development. PH.D. THESIS, p. 1 - 92 (SUSS-MA8, SUSS-RCD8, PARYLENE-SCS)
Brodský J., 2021: Gas sensors based on 1D and 2D materials. MASTER'S THESIS, p. 1 - 84 (DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, ICON-SPM, RIE-FLUORINE, DRIE, LYRA)
Dhankhar, M.;, 2021: Magnetic vortex based memory device. PH.D. THESIS, p. 1 - 100 (KERR-MICROSCOPE, ICON-SPM, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD, WIRE-BONDER, SUSS-RCD8)
GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11 (4), p. 365 - 7, doi: 10.3390/mi11040365 (EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38 (6), p. 38 - 6, doi: 10.1116/6.0000558 (SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA)
Fecko, P., 2019: Gecko mimicking surfaces. MASTER'S THESIS, p. 1 - 52 (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD, RIE-FLUORINE, ICON-SPM, PARYLENE-SCS, XEF2)
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 4, doi: 10.1109/ISSE.2019.8810156 (ALD, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 6, doi: 10.1109/ISSE.2019.8810293 (DRIE, ICON-SPM, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL)
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